Substrate
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SiC wafer 4H-N 6H-N HPSI 4H-semi 6H-semi 4H-P 6H-P 3C type 2inch 3inch 4inch 6inch 8inch
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sapphire ingot 3inch 4inch 6inch Monocrystal CZ KY method Customizable
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2 inch Sic silicon carbide substrate 6H-N Type 0.33mm 0.43mm double-sided polishing High thermal conductivity low power consumption
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GaAs high-power epitaxial wafer substrate gallium arsenide wafer power laser wavelength 905nm for laser medical treatment
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GaAs laser epitaxial wafer 4 inch 6 inch VCSEL vertical cavity surface emission laser wavelength 940nm single junction
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2inch 3inch 4inch InP epitaxial wafer substrate APD light detector for fiber optic communications or LiDAR
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sapphire ring made of synthetic sapphire material Transparent and customizable Mohs hardness of 9
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Sapphire ingot dia 4inch× 80mm Monocrystalline Al2O3 99.999% Single Crystal
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Sapphire Prism Sapphire Lens High transparency Al2O3 BK7 JGS1 JGS2 Material Optical Instrument
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sapphire ring all-sapphire ring entirely crafted from sapphire Transparent lab-made sapphire material
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SiC substrate 3inch 350um thickness HPSI type Prime Grade Dummy grade
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Silicon Carbide SiC Ingot 6inch N type Dummy/prime grade thickness can ba customized