Products
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Laser Anti-Counterfeiting Marking Equipment Sapphire Wafer Marking
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LiTaO₃ Ingots 50mm – 150mm Diameter X/Y/Z-Cut Orientation ±0.5° Tolerance
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6 inch-8 inch LN-on-Si Composite Substrate Thickness 0.3-50 μm Si/SiC/Sapphire of Materials
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Sapphire Windows Optical Glass Customized Size Mohs hardness 9
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Laser Anti-Counterfeiting Marking System for Sapphire Substrates, Watch Dials, Luxury Jewelry
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Sapphire Crystal Growth Furnace KY Kyropoulos Method for Sapphire Wafer and Optical Window Production
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6 inch Conductive single crystal SiC on polycrystalline SiC composite substrate Diameter 150mm P type N type
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High Purity SiC Optical Lens Cubic 4H-semi 6SP Size Customized
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LT Lithium Tantalate (LiTaO3) Crystal 2inch/3inch/4inch/6寸inch Orientaiton Y-42°/36°/108° Thickness 250-500um
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Sapphire Ingot Growth Equipment Czochralski CZ Method for Producing 2inch-12inch Sapphire Wafers
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Premium Sapphire Lift Pins Single crystal Al₂O₃ Wafer lift pin
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LiTaO3 Wafer 2inch-8inch 10x10x0.5 mm 1sp 2sp for 5G/6G Communications