Silicon Carbide Cantilever Paddle (SiC Cantilever Paddle)

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Features

Detailed Diagram

Product Overview

The silicon carbide cantilever paddle, manufactured from high-performance reaction-bonded silicon carbide (RBSiC), is a critical component used in wafer loading and handling systems for semiconductor and photovoltaic applications.
Compared with traditional quartz or graphite paddles, SiC cantilever paddles offer superior mechanical strength, high hardness, low thermal expansion, and outstanding corrosion resistance. They maintain excellent structural stability under high temperatures, meeting the stringent requirements of large wafer sizes, extended service life, and ultra-low contamination.

With the continuous development of semiconductor processes toward larger wafer diameters, higher throughput, and cleaner processing environments, SiC cantilever paddles have gradually replaced conventional materials, becoming the preferred choice for diffusion furnaces, LPCVD, and related high-temperature equipment.

Product Features

Excellent High-Temperature Stability
- Operates reliably at 1000–1300℃ without deformation.
- Maximum service temperature up to 1380℃.
High Load-Bearing Capacity
- Bending strength up to 250–280 MPa, much higher than quartz paddles.
- Capable of handling large-diameter wafers (300 mm and above).
Extended Service Life & Low Maintenance
- Low thermal expansion coefficient (4.5 × 10⁻⁶ K⁻¹), well-matched with LPCVD coating materials.
- Reduces stress-induced cracks and peeling, significantly extending cleaning and maintenance cycles.
Corrosion Resistance & Purity
- Excellent resistance to acids and alkalis.
- Dense microstructure with open porosity <0.1%, minimizing particle generation and impurity release.
Automation-Compatible Design
- Stable cross-sectional geometry with high dimensional accuracy.
- Seamlessly integrates with robotic wafer loading and unloading systems, enabling fully automated production.

Physical & Chemical Properties

Item	Unit	Data
Max. Service Temperature	℃	1380
Density	g/cm³	3.04 – 3.08
Open Porosity	%	< 0.1
Bending Strength	MPa	250 (20℃), 280 (1200℃)
Modulus of Elasticity	GPa	330 (20℃), 300 (1200℃)
Thermal Conductivity	W/m·K	45 (1200℃)
Thermal Expansion Coefficient	K⁻¹×10⁻⁶	4.5
Vickers Hardness	HV2	≥ 2100
Acid/Alkaline Resistance	-	Excellent

Standard lengths: 2378 mm, 2550 mm, 2660 mm
Custom dimensions available upon request

Applications

Semiconductor Industry
- LPCVD (Low Pressure Chemical Vapor Deposition)
- Diffusion processes (phosphorus, boron, etc.)
- Thermal oxidation
Photovoltaic Industry
- Polysilicon and monocrystalline wafer diffusion and coating
- High-temperature annealing and passivation
Other Fields
- High-temperature corrosive environments
- Precision wafer handling systems requiring long service life and low contamination

Customer Benefits

Reduced Operating Costs – Longer lifetime compared with quartz paddles, minimizing downtime and replacement frequency.
Higher Yield – Extremely low contamination ensures wafer surface cleanliness and reduces defect rates.
Future-Proof – Compatible with large wafer sizes and next-generation semiconductor processes.
Improved Productivity – Fully compatible with robotic automation systems, supporting high-volume manufacturing.

FAQ – Silicon Carbide Cantilever Paddle

Q1: What is a silicon carbide cantilever paddle?
A: It is a wafer support and handling component made of reaction-bonded silicon carbide (RBSiC). It is widely used in diffusion furnaces, LPCVD, and other high-temperature semiconductor and photovoltaic processes.

Q2: Why choose SiC over quartz paddles?
A: Compared with quartz paddles, SiC paddles offer:

Higher mechanical strength and load-bearing capacity
Better thermal stability at temperatures up to 1380℃
Much longer service life and reduced maintenance cycles
Lower particle generation and contamination risk
Compatibility with larger wafer sizes (300 mm and above)

Q3: What wafer sizes can the SiC cantilever paddle support?
A: Standard paddles are available for 2378 mm, 2550 mm, and 2660 mm furnace systems. Customized dimensions are available to support wafers up to 300 mm and beyond.

About Us

XKH specializes in high-tech development, production, and sales of special optical glass and new crystal materials. Our products serve optical electronics, consumer electronics, and the military. We offer Sapphire optical components, mobile phone lens covers, Ceramics, LT, Silicon Carbide SIC, Quartz, and semiconductor crystal wafers. With skilled expertise and cutting-edge equipment, we excel in non-standard product processing, aiming to be a leading optoelectronic materials high-tech enterprise.